deposition mask

简明释义

淀积掩模

英英释义

例句

1.During the manufacturing process, the deposition mask must be aligned perfectly with the wafer.

在制造过程中，沉积掩模必须与晶圆完美对齐。

2.The deposition mask helps to define areas where material will be deposited on the substrate.

沉积掩模有助于定义材料将在基底上沉积的区域。

3.Researchers are developing new materials for deposition masks to enhance their durability.

研究人员正在开发新材料用于沉积掩模以增强其耐用性。

4.Using a precise deposition mask is crucial for achieving high-resolution patterns in photolithography.

使用精确的沉积掩模对于在光刻中实现高分辨率图案至关重要。

5.The engineer designed a new deposition mask for the semiconductor fabrication process.

工程师为半导体制造过程设计了一种新的沉积掩模。

作文

In the realm of semiconductor manufacturing and material science, the term deposition mask plays a crucial role in the fabrication of various devices. A deposition mask is a specialized tool used during the deposition process to define patterns on a substrate. This technique is essential for creating intricate designs that are necessary for modern electronic components such as integrated circuits, solar cells, and microelectromechanical systems (MEMS). The use of a deposition mask allows engineers to control which areas of the substrate receive material during the deposition process, thereby enabling the precise formation of desired patterns. The process begins with the preparation of a substrate, which can be made from silicon, glass, or other materials. Once the substrate is ready, a deposition mask is placed over it. This mask is typically made of a material that can withstand high temperatures and chemical exposure, ensuring that it remains intact during the deposition process. The mask contains openings or patterns that correspond to the design specifications, allowing only certain areas of the substrate to be exposed to the deposition material. There are several methods of deposition that can be used in conjunction with a deposition mask, including physical vapor deposition (PVD), chemical vapor deposition (CVD), and atomic layer deposition (ALD). Each of these techniques has its own advantages and is chosen based on the specific requirements of the project. For instance, PVD is often used for metal films, while CVD is preferred for thin films of dielectric materials. Regardless of the method used, the effectiveness of the deposition mask is paramount in achieving the desired results. Once the deposition process is complete, the mask is removed, revealing the patterned substrate underneath. This step is critical, as it determines the quality and precision of the final product. If the deposition mask was not properly aligned or if it suffered damage during the process, it could lead to defects in the patterns, ultimately affecting the performance of the device. Therefore, careful handling and precise manufacturing of the deposition mask are essential for successful outcomes. In conclusion, the deposition mask is an indispensable component in the field of semiconductor fabrication. It enables the creation of complex patterns required for advanced electronic devices, ensuring that each layer of material is applied accurately and efficiently. As technology continues to evolve, the designs and materials used for deposition masks will also advance, leading to even more sophisticated applications in various industries. Understanding the significance of the deposition mask is vital for anyone involved in material science and engineering, as it directly impacts the performance and reliability of electronic devices we rely on in our daily lives.

在半导体制造和材料科学领域，术语deposition mask（沉积掩模）在各种设备的制造中发挥着至关重要的作用。deposition mask是一种专用工具，在沉积过程中用于定义基板上的图案。这项技术对于创建现代电子组件所需的复杂设计是必不可少的，例如集成电路、太阳能电池和微机电系统（MEMS）。使用deposition mask使工程师能够控制在沉积过程中哪个区域接收材料，从而实现所需图案的精确形成。该过程始于基板的准备，基板可以由硅、玻璃或其他材料制成。一旦基板准备好，就会在其上放置deposition mask。这种掩模通常由能够承受高温和化学物质的材料制成，确保它在沉积过程中保持完整。掩模包含与设计规格相对应的开口或图案，仅允许基板的某些区域暴露于沉积材料。有几种沉积方法可以与deposition mask结合使用，包括物理气相沉积（PVD）、化学气相沉积（CVD）和原子层沉积（ALD）。每种技术都有其自身的优点，并根据项目的具体要求进行选择。例如，PVD通常用于金属薄膜，而CVD则更适合用于介电材料的薄膜。无论使用何种方法，deposition mask的有效性在实现预期结果方面都是至关重要的。沉积过程完成后，掩模被移除，露出下面的图案化基板。这一步骤至关重要，因为它决定了最终产品的质量和精度。如果deposition mask未正确对齐或在过程中损坏，可能会导致图案缺陷，最终影响设备的性能。因此，小心处理和精确制造deposition mask对于成功结果至关重要。总之，deposition mask是半导体制造领域不可或缺的组成部分。它使得所需的复杂图案得以创建，确保每一层材料都能精确高效地应用。随着技术的不断发展，用于deposition masks的设计和材料也将不断进步，从而在各个行业中带来更复杂的应用。理解deposition mask的重要性对于任何涉及材料科学和工程的人来说都是至关重要的，因为它直接影响我们日常生活中依赖的电子设备的性能和可靠性。