thermal annealing

简明释义

加温退火

英英释义

例句

1.Researchers used thermal annealing to optimize the optical properties of the thin films.

研究人员利用热退火来优化薄膜的光学特性。

2.The thermal annealing process helps relieve internal stresses in glass components.

热退火过程有助于缓解玻璃组件内部的应力。

3.The process of thermal annealing is crucial in semiconductor fabrication to improve the quality of the materials.

在半导体制造中，热退火过程对于提高材料质量至关重要。

4.In the production of solar cells, thermal annealing can significantly enhance efficiency.

在太阳能电池的生产中，热退火可以显著提高效率。

5.After thermal annealing, the metal showed enhanced ductility and reduced brittleness.

经过热退火后，金属显示出增强的延展性和降低的脆性。

作文

Thermal annealing is a crucial process in materials science and engineering, particularly in the field of semiconductor manufacturing. This technique involves heating a material to a specific temperature and then allowing it to cool down slowly. The primary purpose of thermal annealing (热退火) is to relieve internal stresses, improve the crystallinity of the material, and activate dopants in semiconductors. By doing so, it enhances the electrical properties of the material, making it more suitable for various applications.In semiconductor fabrication, for instance, thermal annealing (热退火) plays a vital role in the production of integrated circuits. After the deposition of thin films, such as silicon or metal layers, these materials often contain defects and impurities that can severely affect their performance. By subjecting them to thermal annealing (热退火), manufacturers can repair these defects and optimize the material's structure. The process typically occurs in a controlled environment, often in a vacuum or an inert atmosphere, to prevent contamination.The temperatures used in thermal annealing (热退火) can vary significantly depending on the material and the desired outcome. For silicon wafers, temperatures may range from 600°C to 1100°C. During this phase, atoms within the material gain energy, enabling them to move and rearrange themselves into a more stable configuration. As the material cools, it settles into this new arrangement, resulting in improved mechanical and electrical properties.Moreover, thermal annealing (热退火) is not limited to semiconductors; it is also widely used in the treatment of metals and alloys. In metallurgy, this process helps to reduce hardness, relieve stress, and enhance ductility. For example, steel components subjected to thermal annealing (热退火) undergo a transformation that makes them easier to work with while maintaining their strength. This is particularly important in manufacturing processes where precise shaping and forming are required.Another significant application of thermal annealing (热退火) is in the production of glass. During the glass-making process, thermal annealing (热退火) is employed to eliminate internal stresses that may arise during cooling. By gradually reducing the temperature of the glass, manufacturers ensure that the final product is free from flaws, resulting in a more durable and aesthetically pleasing material.The effectiveness of thermal annealing (热退火) can be influenced by several factors, including time, temperature, and the atmosphere in which the process occurs. Engineers must carefully calibrate these parameters to achieve the desired material properties. Additionally, advancements in technology have led to the development of rapid thermal annealing (RTA), which allows for faster processing times and better control over the annealing conditions.In conclusion, thermal annealing (热退火) is a fundamental process that significantly impacts the properties of materials across various industries. Its ability to enhance the performance of semiconductors, metals, and glass makes it an indispensable technique in modern manufacturing. Understanding the principles and applications of thermal annealing (热退火) not only contributes to better material design but also drives innovation in technology and engineering practices.